Cleaning principle of single crystal silicon ultrasonic cleaning machine

Cleaning principle of single crystal silicon ultrasonic cleaning machine

Vacuum degassing: Effectively remove gas from the liquid, and use the throwing function to enhance the ultrasonic cleaning ability for oil and dirt on the surface of the workpiece, shortening the cleaning time;

● Washing basket rotating mechanism: overlapping non detachable parts or parts with complex shapes can also be cleaned uniformly and completely;

● Reduced pressure vacuum system: It can suck out air between blind holes, gaps, and overlapping parts, making ultrasonic waves produce amazing cleaning effects under reduced pressure

● Vacuum steam cleaning+vacuum drying system: use steam cleaning for maintenance, achieving perfect cleaning effect;

● The entire process of steam cleaning, drying, and cleaning fluid heating is carried out in a reduced pressure vacuum, more effectively ensuring safety;

● Explosion-proof accessories and simple heating system to further improve safety;

Product Features

1. Heating temperature is automatically adjustable;

2. Equipped with safety devices;

3. Separately excited circuit board structure;

4. The ultrasonic output frequency can be fine-tuned according to different working conditions;

5. Ultrasonic frequency scanning circuit; The ultrasonic generator has a frequency sweep function,

Place the washed and ground silicon wafers horizontally on the fence shaped quartz rod frame above the bottom of the cleaning tank. Under the condition of ensuring that there is a high level of deionized water and continuous flow in the cleaning tank, use an ultrasonic vibrator located at the bottom of the cleaning tank to clean. The ultrasonic frequency is 40KHz. Turn the ground silicon wafers over every 5 minutes, and continue to over wash until no black pollutants emerge from the surface of the ground silicon wafers being over washed.and the easy accumulation of pollutants in the lower part of the surface of the silicon wafer.use an ultrasonic vibrator located at the bottom of the cleaning tank to clean. The ultrasonic frequency is 40KHz. Turn the ground silicon wafers over every 5 minutes

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