Improvement of uniformity of optical film by magnetron sputtering of vacuum electroplating electric heating tube

Improvement of uniformity of optical film by magnetron sputtering of vacuum electroplating electric heating tube

With the development of optical communication, the performance requirements of optical films are getting higher and higher, which puts forward higher requirements for the uniformity of the coating machine. In this paper, by designing a new fixture, the uniformity of the coating machine is optimized from 1% to 0.1%.

With the rapid development of optical communication and other industries, various optical films with different functions have emerged, and their spectral performance requirements are getting higher and higher, and they are more and more widely used. There are more and more difficult films such as 50G and GFF. The requirements for coating machines are also getting higher and higher.

At present, the uniformity of mainstream coating machines on the market can only reach a maximum of 1%, which has little effect when coating ordinary optical films. However, when coating difficult films such as 50G and GFF, the yield and output of the coating are difficult to achieve. Require. At present, most of the measures in the industry are to use a shielding plate to optimize uniformity. However, the shielding plate needs a lot of tests to determine the size, and the shielding plates of different film systems cannot be used universally, which greatly limits the use of the shielding plate. In this paper, the uniformity is improved by directly improving the fixture of the coating machine, and there is no relevant report so far.

Vacuum plating electric heating tube coating with low refractive index film

Coating a low refractive index film layer, transfer the metal film coated product into a coating chamber equipped with a target material that can form a low refractive index film layer, heat it to a process temperature of 80-150 °C, and pass the process gas into the chamber , set sputtering power 1-15KW, coating time 1-300S, to obtain a low-refractive-index film with a thickness of 1-100nm, the low-refractive-index film is silicon oxide, silicon nitride and other films;

​Types, materials and gases of vacuum electroplating electric heating tube targets

Select the target type, material and gas (nitrogen, oxygen, acetylene, methane, argon, etc.), determine the target and gas type, and then adjust the gas ratio, dosage, sputtering power, sputtering time, substrate processing temperature, sputtering According to the process parameters such as sputtering temperature and sputtering time, a color film layer is prepared, which is widely used in the decorative coating industry.

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