Technical characteristics of double-door magnetron sputtering target for vacuum silver plating
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Technical characteristics of double-door magnetron sputtering target for vacuum silver plating
(1) The independent vacuum chamber body is combined into a line, multi-target position, high efficiency, large capacity, double-sided or single-sided simultaneous coating can be selected
(2) Independent vacuum gate valve, more reliable vacuum isolation project
(3) Molecular pump vacuum pumping system, stable pumping speed, clean and oil-free
(4) The system design of the vacuum chamber can be added, and the multi-layer film coating can be realized after expansion.
(5) Optimized target structure design, high target utilization rate
(6) Stable and high-speed sputtering deposition process
(7) Adopt industrial computer, PLC control system to realize automatic operation, touch screen man-machine dialogue interface, multi-function menu
(8) Precise composite vacuum gauge control system with high measurement accuracy to ensure accurate control of the vacuum system
(9) High-precision gas flow control system, high measurement accuracy and fast response speed, to ensure stable and controllable target working atmosphere, stable target operation, stable film deposition, and consistent film thickness
(10) The equipment has a high degree of automation, realizing unmanned operation, and the workpiece can automatically run back to the designated station before and after coating
Vacuum silver indium tin oxide film
Indium tin oxide (Indium Tin Oxide, ITO for short) film is a widely used transparent conductive material, which has been maturely used in motor vehicle windshields, liquid crystal display devices, solar cells, holography and liquid crystal color TVs, etc. The potential application field is the organic light-emitting diode display (Organic Light-Emitting Diode, OLED for short). From the application point of view, the composition of the ITO film is usually required to be In2O3 and SnO2, and the less low-valent compounds of indium and tin in the film, the better. There are many preparation methods for ITO thin films, such as spraying, evaporation, radio frequency sputtering and magnetron sputtering.
The ITO/ISI horizontal continuous coating production line is a large-scale planar magnetron sputtering continuous production equipment. It adopts a modular design, which is convenient for future expansion and upgrading. It is equipped with multiple sets of large-scale magnetron cathodes, which can be applied to the combination of various film structures; Fully automatic control, high-stability transmission system, which can be seamlessly connected with the manipulator to achieve continuous and stable assembly line operations; fast production rhythm and large output.
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