Vacuum silvering reactive sputtering coating

Vacuum silvering reactive sputtering coating

The first is to use compound coating targets. During sputtering, the target compound is decomposed due to the effect of ion bombardment. For example, after using pure argon as the sputtering gas, the stoichiometric ratio of the newly produced film will be distorted. In order to make up for the loss of known components, a certain amount of reactive gas can be added to argon to generate compounds, so as to ensure that the composition of the film layer remains unchanged.

The second is to use pure metal, alloy or mixture as the coating target, in a mixed sputtering atmosphere composed of inert gas and reactive gas, through sputtering and chemical reaction to obtain the compound film.

The main difference between the two forms is the deposition rate and reaction gas pressure. The reactive gases that can be used for reactive sputtering are: air, oxygen or water vapor (to generate oxide film), nitrogen or NH3, (to generate nitride film), oxygen plus nitrogen (to generate oxynitride film), H2S (to generate sulfide film) ), As (generating arsenic film), etc. Some of these gases must pay attention to safety issues in use.

At present, the diameter of the cylindrical magnetron sputtering target has reached 2.5 meters, and the length of the planar magnetron sputtering target has reached 6.5 meters. The emergence of high-power large-area magnetron sputtering targets has opened up a broad path for applications in high-volume industrial production.

Disadvantages of vacuum silver plating resistance evaporation source evaporation method

The disadvantage of the resistance evaporation source evaporation method is that the maximum temperature that can be reached by heating is limited, and the life of the heater is also short. In recent years, in order to improve the life of the resistance evaporation source, the vacuum coating equipment factories at home and abroad have used the conductive ceramic material synthesized by boron nitride with longer life as the evaporation source. According to a Japanese patent report, it can use a material composed of 20% to 30% boron nitride and a refractory material that can be fused with it to make an evaporation source (crucible), and coat its surface with a layer of Contains 62% to 82% of zirconium, and the rest is zirconium-silicon alloy material.

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