What kinds of metal films can be obtained in the PVD process of vacuum electroplating electric heating tubes?

What kinds of metal films can be obtained in the PVD process of vacuum electroplating electric heating tubes?

 

Aluminum (AL), Titanium (Ti), Titanium Nitride (TiN), Cobalt (Co).

 

Generally, when the wafer enters the PVD machine, it must be plated with titanium/titanium nitride/aluminum/titanium/titanium nitride. Five layers of metal.

 

The function of cobalt is metal silicide (silicide).

What is the principle of the PVD process of vacuum electroplating electric heating tube?

 

 

A high potential difference is added between the Target and the wafer. At this time, the process gas Ar dissociates into Ar+ under the high potential difference, and because Ar+ is positively charged and attracted by the electric field, it collides with the Target, causing the target to produce metal grains that fall due to gravity. To the wafer to form a film. This process is PVD.

What is the target of vacuum electroplating electric heating tube?

 

In PVD, the target is a metal material used to provide a film.

The basic principle of vacuum electroplating electric heating tube PVD coating target

 

The basic principle of physical vapor deposition technology can be divided into three processing steps:

 

(1) The vaporization of the coating material, that is, the evaporation of the coating material, which is not similar to sputtering.

 

(2) Migration of electroplating atoms, molecules or ions: Various reactions occur after atoms, molecules or ions collide.

 

(3) Electroplating atoms, molecules or ions are deposited on the substrate.

Vacuum electroplating electric heating tube PVD coating target?

 

Physical vapor deposition (PVD) is a thin film preparation technology that physically vaporizes the surface of a target into gaseous atoms, molecules or parts ionized into ions under vacuum conditions. The functional film is deposited on the surface of the substrate. The main methods of physical vapor deposition include vacuum evaporation, sputtering deposition, arc plasma plating, ion plating, etc. PVD film deposition speed is fast, strong adhesion, good diffraction, and a wide range of applications.

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