Normal working conditions of vacuum coating machine
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Normal working conditions of vacuum coating machine
1. Ambient temperature: 10~30℃
2. Relative humidity: not more than 70
3. Cooling water inlet temperature: not higher than 25℃
4. Cooling water quality: urban tap water or water of equivalent quality
5. Power supply voltage: 380V, three-phase 50Hz or 220V, single-phase 50Hz (depending on the needs of the electrical appliances used), the voltage fluctuation range is 342~399V or 198V~231V, and the frequency fluctuation range is 49~51Hz;
6. The pressure, temperature and consumption of compressed air, liquid nitrogen, hot and cold water, etc. required by the equipment should be stated in the product instruction manual. 7. The surrounding environment of the equipment is clean and the air is clean, and there should be no dust or gas that can cause the surface of electrical appliances and other metal parts to corrode or cause conduction between metals.
Vacuum coating machine film process requirements:
the vacuum degree should not be lower than 103PA, to avoid brown stripes or uneven thickness of the aluminum layer; control the tension of the system, open the cooling system, and avoid stretching and deformation of the film when heated; accurately control the winding speed (280 ~320m/min), aluminum feeding speed (0.4 ~ 0.7m/min? 2mm aluminum wire) and evaporation boat heating current to obtain the aluminum layer thickness (100 ~ 300A°) required by the product; it can be coated on the film in advance Dry primer and fully dry, and then through the vacuum ion coating machine, can improve the bonding force between the aluminum layer and the film. Then a certain amount of protective resin is coated on the aluminum film to prevent the aluminum layer from oxidatively deteriorating. The aluminized film formed by this technology is resistant to friction and not easy to change. Vacuum coating equipment mainly refers to a type of coating that needs to be carried out under high vacuum, including many types, including vacuum ion evaporation, magnetron sputtering, MBE molecular beam epitaxy, PLD laser sputtering deposition and many others.
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